Atomic Layer Deposition for Semiconductors, 1st Edition

  • Published By:
  • ISBN-10: 146148054X
  • ISBN-13: 9781461480549
  • DDC: 621.38152
  • Grade Level Range: College Freshman - College Senior
  • 263 Pages | eBook
  • Original Copyright 2014 | Published/Released June 2014
  • This publication's content originally published in print form: 2014

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This edited volume discusses atomic layer deposition (ALD) for all modern semiconductor devices, moving from the basic chemistry of ALD and modeling of ALD processes to sections on ALD for memories, logic devices, and machines. The section on ALD for memories covers both mass-produced memories, such as DRAM and Flash, and emerging memories, such as PCRAM and FeRAM. The section on ALD for logic devices covers both front-end of the line processes and back-end of the line processes. The final section on ALD for machines looks at toolsets and systems hardware. Each chapter provides the history, operating principles, and a full explanation of ALD processes for each device.

Table of Contents

Front Cover.
Half Title Page.
Title Page.
Copyright Page.
1: Introduction.
2: Introduction.
3: Fundamentals.
4: ALD Precursors and Reaction Mechanisms.
5: ALD Simulations.
6: ALD for Memory Devices.
7: Mass-Production Memories (DRAM and Flash).
9: FeRAM.
10: ALD for Logic Devices.
11: Front End of the Line Process.
12: Back End of the Line.
13: ALD Machines.
14: ALD Machines.
15: Erratum to: Atomic Layer Deposition for Semiconductors.