Subsecond Annealing of Advanced Materials, 1st Edition

  • Published By:
  • ISBN-10: 3319031317
  • ISBN-13: 9783319031316
  • DDC: 621.381542
  • Grade Level Range: College Freshman - College Senior
  • 321 Pages | eBook
  • Original Copyright 2014 | Published/Released May 2014
  • This publication's content originally published in print form: 2014

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The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

Table of Contents

Front Cover.
Half Title Page.
Other Frontmatter.
Title Page.
Copyright Page.
1: Historical Aspects of Subsecond Thermal Processing.
2: Nanonet Formation by Constitutional Supercooling of Pulsed Laser Annealed, Mn-Implanted Germanium.
3: Metastable Activation of Dopants by Solid Phase Epitaxial Recrystallisation.
4: Superconducting Gallium Implanted Germanium.
5: Structural Changes in SiGe/Si Layers Induced by Fast Crystallization.
6: Sub-nanosecond Thermal Spike Induced Nanostructuring of Thin Solid Films Under Swift Heavy Ion (SHI) Irradiation.
7: Pulsed-Laser-Induced Epitaxial Growth of Silicon for Three-Dimensional Integrated Circuits.
8: Improvement of Performance and Cost of Functional Films Using Large Area Laser RTP.
9: Pulsed Laser Dopant Activation for Semiconductors and Solar Cells.
10: Formation of High-Quality μm-Order-Thick Poly-Si Films on Glass-Substrates by Flash Lamp Annealing.
11: Millisecond-Range Liquid-Phase Processing of Silicon-Based Hetero-nanostructures.
12: Radiation Thermometry—Sources of Uncertainty During Contactless Temperature Measurement.
13: Millisecond Annealing for Semiconductor Device Applications.
14: Low-Cost and Large-Area Electronics, Roll-to-Roll Processing and Beyond.
15: Application of Sub-second Annealing for Diluted Ferromagnetic Semiconductors.